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Subject : Prof. Taek Dong Chung develop dielectric film where current flows
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Information Date : 2013/12/05 14:23 , Hit : 626
Prof. Taek Dong Chung and his research team, devoted to one of our research project entitled “Molecular Energy Integration System Technology”, developed a dielectric film where current flows.
The research team found that, under a specific condition, enough current can pass through the dielectric Oxidized Silicon Film and, by controlling the current flow, a variety of electro-chemical reactions can be induced thereon.

This research result is released in Nature Communications, November 2013.

For more information, get reference from following links:

http://www.hankyung.com/news/app/newsview.php?aid=2013120176501
http://www.ajunews.com/view/20131201113414234
http://news.hankooki.com/lpage/it_tech/201312/h20131201140441122340.htm
http://news.mt.co.kr/mtview.php?no=2013120110161970140&type=1&VML
http://news.newsway.co.kr/view.php?tp=1&ud=2013120114444948656&md=20131201145230_AO
http://news.naver.com/main/read.nhn?mode=LSD&mid=sec&sid1=101&oid=001&aid=0006625751
http://view.asiae.co.kr/news/view.htm?idxno=2013120110403174028
http://www.dt.co.kr/contents.html?article_no=2013120202011576650004
http://www.etnews.com/news/economy/education/2877678_1491.html